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Q1200 Flood Expose System

A unique machine with single and double-sided exposure capability. Designed specifically for single mask level applications and/or gross geometries and non-critical alignment - current applications include power devices, LEDs and MEMs applications.

Q1200 Flood Expose System R&D and production applications
Manual loading of substrates
Single-side and double-side exposure   capability
Small pieces to 200 mm diameter   substrate size

Available Options:

• CCTV Microscope
• Manual X, Y and theta alignment   stage



Mask Aligners | Q1200 Flood Expose System | NeuVision² Automated Pattern Recognition Alignment System




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Phone: +84(8) 5446-4789
Email:
hcmc@acrosemi.com
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Email:
hanoi@acrosemi.com

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