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Neutronix_Quintel (NXQ) Products
A unique machine with single and double-sided exposure capability. Designed specifically for single mask level applications and/or gross geometries and non-critical alignment - current applications include power devices, LEDs and MEMs applications.
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 R&D and production applications
Manual loading of substrates
Single-side and double-side exposure capability
Small pieces to 200 mm diameter substrate size
Available Options:
• CCTV Microscope
• Manual X, Y and theta alignment stage
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